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CERTIFICATES
Jump
to Certificate in Imaging
Certificate
in Semiconductor Materials and Devices
The certificate will consist of 20 credit hours of
which 12 credit hours will be required courses.
Students interested in pursuing this certificate
should see a PHOE certificate advisor. (Professors:
McInerney, Siahmakoun, and Wagner)
Required Courses
|
Course Description |
Hours |
Course Prerequisites |
|
1. PH 405
Semiconductor Materials and Devices I
|
3R-3L-4C F
|
PH 113 or PH 255 or PH 265 or
consent of instructor. |
|
2. PH 406
Semiconductor Materials and Devices II
|
3R-3L-4C W |
PH 405 or consent of the
instructor |
|
3. PH 410
to MEMS: Fabrication and App
Or CHE 440 Process Control |
3R-3L-4C S
|
JR or SR standing or consent of
the instructor
|
|
4R-0L-4C W |
CHE 202 |
Electives
|
Course |
Hours |
Course Description |
|
OE 450 |
4 |
Laser Systems and Applications |
|
OE 485 |
4 |
Electro-Optics and Applications |
|
PH 330 |
4 |
Material Failure |
|
PH 401 |
4 |
Quantum Mechanics |
|
PH 440 |
4 |
X-rays and Crystalline Materials |
|
PH 408 |
4 |
Microsensors |
|
PH 411 |
4 |
Advanced MEMS: Modeling and
Packaging |
|
ECE 350 |
4 |
Electronics and Interfacing |
|
ECE 351 |
4 |
Analog Electronics |
|
ECE 551 |
4 |
VLSI Design and Testing I |
|
ECE 552 |
4 |
VLSI II: Mixed-Signal IC Design |
|
ME 302 |
4 |
Heat Transfer |
|
ME 328 |
4 |
Materials Engineering |
|
ME 424 |
4 |
Composite Materials |
|
ME 415 |
4 |
Corrosion and Engineering
Materials |
|
CHE 314 |
4 |
Heat Transfer |
|
CHE 315 |
4 |
Material Science and Engineering |
|
CHE 440 |
4 |
Process Control |
|
CHE 441 |
4 |
Polymer Engineering |
|
CHEM 441 |
4 |
Inorganic Chemistry I |
|
CHEM 451 |
4 |
Organic Structure Determination |
|
CHEM 456 |
4 |
Polymer Chemistry I |
|
CHEM 457 |
4 |
Polymer Chemistry II |
|
MA 487 |
4 |
Design of Engineering
Experiments |
|
MA 381 |
4 |
Intro to Probability with
Statistical Applications |
|
MA 385 |
4 |
Quality Methods |
Overall aim of the Certificate
A
certificate holder will understand how semiconductor
devices work, have practical experience in the main
stages of device production, have practical
experience in the more common forms of device
testing and characterization, and have broad
understanding of the mechanical and chemical
properties of the material used.
A
Certificate holder will be well suited for jobs
requiring an understanding of semiconductor devices
and their production. These jobs include not only
those directly related to device fabrication, but
also those involved with testing and
trouble-shooting electronic equipment and the design
of machines that contain electronic equipment. The
experience in simple device fabrication that the
Certificate provides is particularly useful for
future engineers in a process in industries.
Certificate
in Imaging
Imaging concerns the collection, manipulation,
analysis, generation,
understanding and processing of images. It is a new
and rapidly growing
subject that includes computer graphics, computer
vision, optical
imaging and filtering, signal processing and aspects
of artificial
intelligence. Rose-Hulman Institute of Technology
offers an
undergraduate multidisciplinary Imaging Systems
Certificate. Hands-on
experience is emphasized in the well-equipped
Imaging Systems
Laboratory, which is used for project work by
certificate students and
graduate students whose theses involve imaging.
The certificate
recognizes undergraduate students who have gained a
grounding in Imaging Systems while at Rose-Hulman.
The certificate
requires 6 courses (24 credits). Three courses are
required core
courses, two are electives, and one is the imaging
systems project. A
student would expect to take these courses starting
in the junior year.
A student in any major should be able to obtain a
certificate with
minimal, if any, course overload. Students
interested in pursing the
Imaging Systems Certificate should see the
certificate advisor (listed
below).
Required Courses
| CS
351 |
Computer Graphics |
|
ECE 480 / PH 437 |
Introduction to Image Processing |
|
ECE 582 / PH 537 |
Advanced Image Processing |
Elective Courses (choose 2)
|
CS 325 / MA 325 |
Fractals and
Chaotic Dynamical Systems |
|
CS 413 |
Artificial
Intelligence |
|
CS 451 |
Advanced Computer
Graphics |
|
ECE 510 |
Error Correcting
Codes |
|
ECE 580 |
Digital Signal
Processing |
|
ECE 581 |
Digital Signal
Processing Projects |
|
MA 321 |
Topics in Geometry |
|
MA 439 |
Mathematical
Methods of Image Processing |
|
PH 280 |
Paraxial Optics |
|
PH 292 |
Physical Optics
|
|
PH 380 |
Lens Design and
Aberrations |
|
PH 392 |
Coherent Wave
Optics |
|
PH 592 |
Fourier Optics and
Applications |
XX -
Special Topics courses with an imaging focus (e.g.,
CS 490 -
Computer Vision) (these must receive Imaging Systems
faculty approval to
count toward the certificate)
Imaging Systems Project
A project with a significant imaging component. This
may be done in any
discipline. Projects must be approved by the Imaging
Systems faculty.
Imaging Systems Faculty
Jameel Ahmed, Department of Applied Biology and
Biomedical Engineering
S. Allen Broughton, Department of Mathematics
Robert M. Bunch, Department of Physics and Optical
Eng.
Edward R. Doering, Department of Electrical and
Computer Engineering
David L. Finn, Department of Mathematics
Aaron D. Klebanoff, Department of Mathematics
Cary Laxer, Department of Computer Science (Imaging
Systems Certificate advisor)
Robert J. Lopez, Department of Mathematics
James E. Mayhew, Department of Mechanical
Engineering
J.P. Mellor, Department of Computer Science
Michael F. McInerney, Department of Physics and
Optical Eng.
Wayne T. Padgett, Department of Electrical and
Computer Engineering
Mark A. Yoder, Department of Electrical and Computer
Engineering
Direct questions to:
sidney.l.stamm@rose-hulman.edu
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