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Renowned lithography expert and Rose-Hulman Institute of Technology
alumnus Chris A. Mack has been appointed editor of the Journal of
Micro/Nanolithography, MEMS, and MOEMS by the Society of Photo-Optical
Instrumentation Engineers (SPIE). The appointment is effective on Jan.
1, 2012.
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Chris A. Mack |
Mack received multiple undergraduate degrees from Rose-Hulman in 1982, a
master’s degree in electrical engineering from the University of
Maryland and a doctorate in chemical engineering from the University of
Texas. He now serves as an adjunct faculty member at UT, and frequently
writes, teaches, and consults on semiconductor lithography. He is also a
Rose-Hulman trustee, and is an advisor to the Department of Physics and
Optical Engineers and Department of Chemistry and Biochemistry.
The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) is a
quarterly publication of peer-reviewed papers on the development of
lithographic fabrication, packaging, and integration technologies
necessary to address the needs of the electronics,
microoptoelectromechanical systems and photonics industries.
"Since its founding, JM3 has become the preeminent journal in the
various fields of microfabrication," said Mack in a news release. "I'm
thrilled to be continuing the work of Burn Lin and to carry on the
tradition of excellence at this journal."
Mack will succeed JM3 founding editor Burn Lin, senior director of
nanopatterning technology for the Taiwan Semiconductor Manufacturing Co.
"Dr. Mack is an internationally recognized expert in lithography who
brings a wealth of knowledge, insight and enthusiasm that will be a
great benefit to the journal and the entire technical community,” said
SPIE Publications Committee Chair John Greivenkamp.
Mack received the 2003 SEMI Award for North America for his efforts in
lithography simulation and education; in 2009 received the SPIE’s Frits
Zernike Award for Microlithography; and was elected as an IEEE Fellow in
2010. He began working with lithography while at the Microelectronics
Research Laboratory of the National Security Agency.
After an assignment to Sematech, Mack left the NSA and founded FINLE
Technologies to commercialize PROLITH, the simulator he had developed to
model optical and chemical aspects of photolithography. FINLE
Technologies was purchased in 2000 by KLA-Tencor, and Mack served as
vice president of lithography technology until 2005.
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