Mack, vice president of lithography for KLA-Tencor Corp., was recognized for his development of software programs that have enabled process engineers to increase the productivity of the lithography process.  His work has driven changes in masks, imaging, tools, photoresist and measurement.

In 1990, Mack left his job at the U.S. Department of Defense and founded FINLE Technologies.  He developed the PROLITH Toolkit of lithography simulation and analysis programs.  He has authored more than 100 technical publications on lithography.  In February of 2000, FINLE was acquired by KLA-Tencor.